Abstract
The research program of the Thin Film Group at Linköping concerns the materials science and nanotechnology of thin films. It is aimed at increasing the understanding of vapor phase deposition, ion-surface interactions, and reactions in advanced functional materials. Specifically, we focus on the nature of epilayers, textured films, and nanoscale materials. Model systems include transition metal nitrides, wide-band gap nitrides, multifunctional ceramics (MAX phases; e.g., Ti3SiC2, Ti2AlN), nanocomposites, superlattices, fullerene-like compounds, and nm-sized metallic multilayers. Several deposition techniques are covered including magnetron sputter epitaxy (MSE) and cathodic arc. Our laboratory specializes in applying and developing methods for plasma characterization, analytical and high-resolution electron microscopy, X-ray diffraction, nanoindentation, ab initio calculations, and multi-billion time-step molecular dynamics simulations.
This seminar provides results from studies of nanostructuring in transition metal nitrides, which are used for advanced surface engineering and electronics. Analysis of the TiAlN, TiSiN, ScAlN, and InAlN systems by nanoindentation, XRD, HREM, and Atom Probe Tomography is coupled with ab initio calculations of phase stability and decomposition behavior by lattice mismatch and electronic band structure effects.
Nombre: Juan J. Núñez C.
Materia: CRF
Sección: 01
Leer:[Jn8:36]
The research program of the Thin Film Group at Linköping concerns the materials science and nanotechnology of thin films. It is aimed at increasing the understanding of vapor phase deposition, ion-surface interactions, and reactions in advanced functional materials. Specifically, we focus on the nature of epilayers, textured films, and nanoscale materials. Model systems include transition metal nitrides, wide-band gap nitrides, multifunctional ceramics (MAX phases; e.g., Ti3SiC2, Ti2AlN), nanocomposites, superlattices, fullerene-like compounds, and nm-sized metallic multilayers. Several deposition techniques are covered including magnetron sputter epitaxy (MSE) and cathodic arc. Our laboratory specializes in applying and developing methods for plasma characterization, analytical and high-resolution electron microscopy, X-ray diffraction, nanoindentation, ab initio calculations, and multi-billion time-step molecular dynamics simulations.
This seminar provides results from studies of nanostructuring in transition metal nitrides, which are used for advanced surface engineering and electronics. Analysis of the TiAlN, TiSiN, ScAlN, and InAlN systems by nanoindentation, XRD, HREM, and Atom Probe Tomography is coupled with ab initio calculations of phase stability and decomposition behavior by lattice mismatch and electronic band structure effects.
Nombre: Juan J. Núñez C.
Materia: CRF
Sección: 01
Leer:[Jn8:36]
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